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Meet Air Liquide at the 19th International Conference on Atomic Layer Deposition

Air Liquide will be present at the 19th ALD Conference

Bringing molecules safely to the heart of the deposition or scaling-up promising processes can be a challenge. Come discover Air Liquide’s solutions during a 3-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and new topics related to atomic layer etching. We provide systems distributing precursors such as gases, liquids or solids that can help you overcome the challenges you’re facing and get game-changing results.

Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. Anticipated attendance is 800+ people.

More information :

Visit us at Air Liquide's booths #300 and #302.