Precursors distribution - Candi™

For the continuous reliable distribution of advanced low vapor pressure liquid precursors

Air Liquide developed the Candi™ range to transfer precursors from shuttle canisters to your point-of-use. The equipment allows continuous distribution at consistent pressure, including during shuttle canister change-out.

Candi™ range

Applications

The equipment is a solution applicable to the fields of atomic layer deposition, chemical vapor deposition, plasma-enhanced chemical vapor deposition.

The Candi™ range allows liquid precursors distribution for:

Direct liquid injection (DLI)
On-board bubblers
Vaporizers and on-board buffer canisters.

To fit your needs, multiple examples of precursors can be used with the Candi™ range:

Borophosphosilicate Glass (BPSG) processes: Tetraethyl orthosilicate (TEOS), Triethyl phosphate (TEPO), Triethylborane (TEB), etc.
Low-k dielectrics: Tetramethylsilane (4MS), Tetramethylcyclotetrasiloxane (TMCTS), Octamethylcyclotetrasiloxane (OMCTS), 2,3-Dimercapto-1-propanesulfonic acid (DMPS), BCHD, etc.
High-k dielectrics: DMAI, TDMAS, 4DMAS, etc.
Low-T SiN/SiO: HCDS, SAM.24™, BTBAS, etc.
TCO process: DEZ
High k dielectrics: TMA
Si sources: HMDSO, HMDSN

Other highly viscous precursors are also taken care of with the “Candi™ Solvent”.

Advantages

High level of safety and reliability for continuous supply of liquid precursors to the customer tool.
Patented empty shuttle canister detection for maximum chemical use.
Customized signal interface adapted to your equipment.

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ALES Candi™

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Candi™ Bulk

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Candi™ Solvent

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Candi™ Bubbler

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Candi™ Phase 2

Candi™ Phase 2 is fitted with an internal day tank that allows the continuous distribution of the liquid precursors at a steady pressure, including during shuttle canister change-out. There are several Candi™ Phase 2 solutions: from the Candi™ Lite for research & R&D to the Candi™ Phase 2 pyrophoric with increased safety features.

Candi™ Phase 2 features

Back-up distribution mode for improved reliability
Precise delivery control (+/- 50 mbar) for the most demanding applications
System adapts to any SEMI-compliant shuttle canister up to 40 L

Candi™ Phase 2 Pyrophoric

Dedicated design for pyrophoric precursors:
Fire sensor
Nitrogen deluge system
Automatic exhaust damper, and a drain line.
Liquid sealant tank and a knock-out tank on the vent line

Options for the Candi™ Phase 2 and Candi™ Phase 2 Pyrophoric

On-board vacuum pump
4 process outlets
Degassing device
Multiple communication protocols available
Start-up and operator training

Candi™ Bulk

Candi™ Bulk is compatible with large shuttle containers (up to 200 L) and includes a bigger day tank suited for bulk use. A pyrophoric version is also available.

Candi™ Bulk features

Back-up distribution mode for improved reliability
Precise delivery control (+/- 50 mbar) for the most demanding applications
System adapts to any SEMI-compliant shuttle canister up to 200 L
Dedicated design for pyrophoric precursors:
- Fire sensor
- 2 auto-switching shuttle tanks and a bigger day tank

Candi™ Solvent

Air Liquide’s Candi™ Solvent is designed to provide you with a continuous supply of viscous and highly reactive very-low vapor pressure liquid precursors at consistent pressure. Candi™ Solvent performs patented solvent cleaning for contamination-free distribution and increased safety. Solvent cleaning eliminates any risk of clogging, ensures safe shuttle drum change-out, and prevents the contamination of precursors that are sensitive to air and moisture.

Our solution

Our solution works with a wide range of precursors:

Gate oxide processes: PET, TBTDET, TDEAH, TEMAH, HTB, etc.
DRAM: TEMAZ, HyALD™, ZyALD™, etc.
Barrier metals: TDMAT, TDEAT, TBTDET, etc.
Ultra-low T SiN: AHEAD™, etc.

Candi™ Solvent features

System adapts to any SEMI-compliant shuttle canister up to 40L
Up to 5-Gallon waste and solvent tank in separate enclosure
Back-up distribution mode for improved reliability
Optical fiber day tank level monitoring
Precise delivery pressure control (± 50 mbar) for the most demanding applications
Valve Manifold Box (VMB) for distribution to multiple points of use
Chemical purge sequence compliant with live chemicals
Ethernet communication port for SCADA monitoring

Candi™ Bubbler

Gaseous distribution of liquid precursors - Candi™ Bubbler

The Candi bubbler closely controls the temperature and pressure while bubbling a carrier gas through a liquid precursor. This allows Candi to ensure consistent gas flow and precursor concentration to the downstream reactor process.

The Candi™ Bubbler is used to saturate by bubbling a carrier gas such as Helium or Nitrogen with liquid precursor and distribute it at a steady concentration and pressure to a Point-of-Use (POU).

Advantages

Unsurpassed performance : Up to 30 liters/minute (12% TMGa in carrier gas) with variable flow rate and stable concentration allows Individual bubbler or centralised distribution
Fits your needs : Candi™ Bubbler can either include shuttle canister up to 20 liters inside the cabinet or be fed with an external liquid source

Efficient & easy-to-use: you just need to enter on the touch screen the precursor concentration and the total flow rate requested at the POU.

Applications

Chemical Vapor Deposition (CVD)
Atomic Layer Deposition (ALD)
Epitaxiy (EPI)

Equipment designed for the semiconductor, fiber optic, coating, solar and compound semiconductor industries, where safety, purity, accuracy and consistency are critical to your process.

Example of bubbled precursor:

TMA - TriMethylAluminium - Al2(CH3)6
TMGa/TMG - TriMethylGallium - Ga(CH3)3
Trichlorosilane - HCl3Si
Tetrachlorosilane - SiCl4
Germanium chloride - GeCl4

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