Liquid precursors distribution - Candi™
For the continuous reliable distribution of advanced low vapor pressure liquid precursors
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Candi™ range
Applications
The equipment is a solution applicable to the fields of atomic layer deposition, chemical vapor deposition, plasma-enhanced chemical vapor deposition.
The Candi™ range allows liquid precursors distribution for:
- Direct liquid injection (DLI)
- On-board bubblers
- Vaporizers and on-board buffer canisters.
To fit your needs, multiple examples of precursors can be used with the Candi™ range:
- Borophosphosilicate Glass (BPSG) processes: Tetraethyl orthosilicate (TEOS), Triethyl phosphate (TEPO), Triethylborane (TEB), etc.
- Low-k dielectrics: Tetramethylsilane (4MS), Tetramethylcyclotetrasiloxane (TMCTS), Octamethylcyclotetrasiloxane (OMCTS), 2,3-Dimercapto-1-propanesulfonic acid (DMPS), BCHD, etc.
- High-k dielectrics: DMAI, TDMAS, 4DMAS, etc.
- Low-T SiN/SiO: HCDS, SAM.24™, BTBAS, etc.
- TCO process: DEZ
- High k dielectrics: TMA
- Si sources: HMDSO, HMDSN
Other highly viscous precursors are also taken care of with the “Candi™ Solvent”.
Advantages
- High level of safety and reliability for continuous supply of liquid precursors to the customer tool.
- Patented empty shuttle canister detection for maximum chemical use.
- Customized signal interface adapted to your equipment.
Candi™ Phase 2
Candi™ Phase 2 is fitted with an internal day tank that allows the continuous distribution of the liquid precursors at a steady pressure, including during shuttle canister change-out. There are several Candi™ Phase 2 solutions: from the Candi™ Lite for research & R&D to the Candi™ Phase 2 pyrophoric with increased safety features.
Candi™ Phase 2 features
- Back-up distribution mode for improved reliability
- Precise delivery control (+/- 50 mbar) for the most demanding applications
- System adapts to any SEMI-compliant shuttle canister up to 40 L
Candi™ Phase 2 Pyrophoric
Dedicated design for pyrophoric precursors:
- Fire sensor
- Nitrogen deluge system
- Automatic exhaust damper, and a drain line.
- Liquid sealant tank and a knock-out tank on the vent line
Options for the Candi™ Phase 2 and Candi™ Phase 2 Pyrophoric
- On-board vacuum pump
- 4 process outlets
- Degassing device
- Multiple communication protocols available
- Start-up and operator training
Candi™ Bulk
Candi™ Bulk is compatible with large shuttle containers (up to 200 L) and includes a bigger day tank suited for bulk use.
A pyrophoric version is also available.
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Candi™ Bulk features
- Back-up distribution mode for improved reliability
- Precise delivery control (+/- 50 mbar) for the most demanding applications
- System adapts to any SEMI-compliant shuttle canister up to 200 L
- Dedicated design for pyrophoric precursors:
- Fire sensor
- 2 auto-switching shuttle tanks and a bigger day tank
Candi™ Solvent
Air Liquide’s Candi™ Solvent is designed to provide you with a continuous supply of viscous and highly reactive very-low vapor pressure liquid precursors at consistent pressure. Candi™ Solvent performs patented solvent cleaning for contamination-free distribution and increased safety. Solvent cleaning eliminates any risk of clogging, ensures safe shuttle drum change-out, and prevents the contamination of precursors that are sensitive to air and moisture.
Our solution
Our solution works with a wide range of precursors:
- Gate oxide processes: PET, TBTDET, TDEAH, TEMAH, HTB, etc.
- DRAM: TEMAZ, HyALD™, ZyALD™, etc.
- Barrier metals: TDMAT, TDEAT, TBTDET, etc.
- Ultra-low T SiN: AHEAD™, etc.
Candi™ Solvent features
- System adapts to any SEMI-compliant shuttle canister up to 40L
- Up to 5-Gallon waste and solvent tank in separate enclosure
- Back-up distribution mode for improved reliability
- Optical fiber day tank level monitoring
- Precise delivery pressure control (± 50 mbar) for the most demanding applications
- Valve Manifold Box (VMB) for distribution to multiple points of use
- Chemical purge sequence compliant with live chemicals
- Ethernet communication port for SCADA monitoring
Gaseous distribution of liquid precursors - Candi™ Bubbler
The Candi bubbler closely controls the temperature and pressure while bubbling a carrier gas through a liquid precursor. This allows Candi to ensure consistent gas flow and precursor concentration to the downstream reactor process.
The Candi™ Bubbler is used to saturate by bubbling a carrier gas such as Helium or Nitrogen with liquid precursor and distribute it at a steady concentration and pressure to a Point-of-Use (POU).
Advantages
- Unsurpassed performance
- Up to 30 liters/minute (12% TMGa in carrier gas) with variable flow rate and stable concentration allows Individual bubbler or centralised distribution
- Fits your needs
- Candi™ Bubbler can either include shuttle canister up to 20 liters inside the cabinet or be fed with an external liquid source
Efficient & easy-to-use: you just need to enter on the touch screen the precursor concentration and the total flow rate requested at the POU.
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Applications
- Chemical Vapor Deposition (CVD)
- Atomic Layer Deposition (ALD)
- Epitaxiy (EPI)
Equipment designed for the semiconductor, fiber optic, coating, solar and compound semiconductor industries, where safety, purity, accuracy and consistency are critical to your process.
Example of bubbled precursor:
- TMA - TriMethylAluminium - Al2(CH3)6
- TMGa/TMG - TriMethylGallium - Ga(CH3)3
- Trichlorosilane - HCl3Si
- Tetrachlorosilane - SiCl4
- Germanium chloride - GeCl4